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David Hwang is an Intel Fellow and the director of Flash Memory Process Technology in California Technology and Manufacturing (CTM), part of Intel's Technology and Manufacturing Group. He is responsible for developing advanced patterning technology for flash memory products.
Since 2002, Hwang, who is located in Santa Clara, CA, has been leading CTM's Advanced Patterning Team. This team is responsible for developing integrated patterning capabilities including photomask, lithography, etching and layout optimization for 90nm, 65nm and 45nm node flash memory product. He also leads the effort to define the flash memory module long term roadmap.
Intel is recognized as the leader of photomask technology, and Hwang has been actively engaged in mask technology benchmarking and collaboration programs to establish partnership and strategic relationship in the industry. Hwang developed lithographical capabilities for P620, P852 and P801 in California Technology and Manufacturing (CTM) between 1987 and 1994. He joined Intel Mask Operations (IMO) in 1994 as an Engineering Manager, and was appointed as the Chief Mask Technologist in 1998. He was the architect of Intel's Mask Technology Roadmap and developed photomask capabilities to enable Intel silicon technologies from 0.5um to 0.090um. Hwang contributed to establishing the industrial photomask infrastructure by jointly developing mask CD metrology equipment, plasma etching capabilities, a vector scan electron beam mask writer, and an electron beam resist coating system with the equipment suppliers worldwide.
Hwang served as the Intel representative on the Mask Advisory Steering Committee in International Sematech from 1995 through 2004. He was a key contributor to the International Technology Roadmap of Semiconductors (ITRS) Mask Technology Roadmap.
Before joining Intel in 1987, Hwang worked on lithography development and silicon process integration in Silicon Valley. Hwang received his bachelor's degree in Electrical Engineering from National Taiwan University and his master's degree in Electrical Engineering from the University of Pennsylvania. | 